Atomic Layer Deposition - ZnO - DEZn - H2O
收藏DataCite Commons2026-02-11 更新2026-05-04 收录
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https://orkg.org/comparison/R1583016
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资源简介：
This comparison summarizes reported Atomic Layer Deposition (ALD) processes for zinc oxide (ZnO) thin films using diethylzinc (DEZn) as the metal precursor and water (H₂O) as the coreactant. It highlights key process parameters and outcomes across studies to enable direct comparison of growth conditions, film properties, and performance metrics for the DEZn/H₂O ALD system.
提供机构：
Open Research Knowledge Graph
创建时间：
2026-02-11
