Videomicroscopic Semi-Shadow Visualization of LoC-Si (Lab-on-a-Chip_[based_on]_Silicone) Test Structures using Binocular Stereoscopic Microscope and Indirect Angular Illumination Scheme (BSI-IAIS)

Videomicroscopic Semi-Shadow Visualization of LoC-Si (Lab-on-a-Chip_[based_on]_Silicone) test structures from Institute of Molecular Electronics (D. Shevchenko; founder of Scientific and Production Association "Microbiotechniques" Ltd.) and Russian Academy of Sciences (INEPCP RAS; ICP RAS) Vis. Tech.: MBS-10 Binocular Stereoscopic Microscope; Indirect Angular Illumination. Found.: Initiative project (D. Shevchenko, O. Gradov; 2015-2016) Fab.: JSC “Voskhod” KRLZ* * JSC “Voskhod”-KRLZ practices vacuum electron-beam and magnetron spattering techniques for the deposition of thin dielectric, resistant and metal films. JSC “Voskhod” KRLZ was founded in 1960. It is one of the largest manufacturers of electronic components in Russia. One of the priority lines of our development has become a production of materials for electronics manufacturing industry: an assortment of rolled metal bands from nonferrous, ferrous and high alloys; multilayered clad metal bands, high alloyed bimetallic micron scale wire; pseudo alloys; epitaxial structures GaAlAs; amorphous tapes.

本数据集收录了分子电子学研究所（由Shevchenko博士创立的科学与生产协会“微生物技术”有限公司）及俄罗斯科学院（INEPCP RAS；ICP RAS）提供的LoC-Si（基于硅的芯片实验室）测试结构的半影显微视觉图像。观测设备为MBS-10双目立体显微镜，采用间接角向照明。图像采集项目为Shevchenko博士与Gradov博士发起的倡议项目（2015-2016年）。制造方为JSC“Voskhod”KRLZ公司。JSC“Voskhod”-KRLZ公司擅长采用真空电子束和磁控溅射技术沉积薄层介电、耐蚀和金属薄膜。该公司成立于1960年，是俄罗斯最大的电子元件制造商之一。我们发展的优先方向之一已成为电子制造业材料的制作：包括非铁、铁和高温合金的卷材金属带；多层包覆金属带，高合金双金属微米级线材；假合金；外延结构GaAlAs；非晶薄膜。