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Study of W centers formation in silicon upon ion implantation and rapid thermal annealing

NIAID Data Ecosystem2026-05-01 收录

半导体缺陷工程

离子注入工艺

数据链接：

https://zenodo.org/record/10039530 数据链接链接失效反馈

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资源简介：

Dataset for the paper Study of W centers formation in silicon upon ion implantation and rapid thermal annealing doi: https://doi.org/10.1109/SUM57928.2023.10224442

应用场景：

创建时间：

2023-10-25

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