Energy distribution of negatively and positively charged ions in a magnetron sputtering discharge with a tungsten cathode and a positively biased anode in an argon/oxygen gas mixture.

The energy distribution of negatively and positively charged ions in a magnetron discharge with a positively biased anode is investigated. A tungsten cathode operated in an argon/oxygen gas mixture is employed. The magnetron is operated either in direct current (DCMS) or in high power impulse magnetron sputtering (HiPIMS) mode.