XRD patterns of the V2O5 coatings after thermal treatment under reducing atmosphere
收藏Mendeley Data2024-01-31 更新2024-06-28 收录
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The DataSet contains the XRD patterns of V2O5 coatings on the silicon substrate after thermal treatment under a reducing atmosphere. Thin films were annealed at 500C, 600C, and 700C for 10 under a reducing atmosphere (94% Ar, 6% H2). The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape. The as-prepared thin film was annealed at 300C under oxidizing atmosphere for 10h, the information about thin film preparation is described in the Journal of Nanomaterials.
创建时间：
2024-01-31
