Vapor-Phase Metalation by Atomic Layer Deposition in a Metal–Organic Framework

Metal–organic frameworks (MOFs)
have received attention
for a myriad of potential applications including catalysis, gas storage,
and gas separation. Coordinatively unsaturated metal ions often enable
key functional behavior of these materials. Most commonly, MOFs have
been metalated from the condensed phase (i.e., from solution). Here
we introduce a new synthetic strategy capable of metallating MOFs
from the gas phase: atomic layer deposition (ALD). Key to enabling
metalation by ALD In MOFs (AIM) was the synthesis of NU-1000, a new, thermally
stable, Zr-based MOF with spatially oriented −OH groups and
large 1D mesopores and apertures.