High-throughput XRR studies of catalytic direct bonding of hydrophilic Si wafers

This study investigates the impact of catalytic agents on the bonding process at hydrophilic silicon interfaces during low-temperature annealing.Traditionally, strong
bonding at these interfaces necessitates temperatures exceeding 100°C due to the energy barrier associated with forming inter-wafer siloxane bonds. However, recent
studies suggest that the addition of amino-alcohol compounds can facilitate bonding at significantly lower temperatures. This study employs high-energy interface X-
ray reflectometry (XRR) to compare the evolution and closure dynamics of interfaces with and without the catalyst.The study expects to confirm that the proposed
mechanisms, namely the catalytic effects favoring siloxane condensation, are consistent with the observations. Lower-temperature bonding achieved with the catalyst
is expected to provide a clearer understanding of the reaction sequence, including inter-wafer siloxane bond formation, water migration into the oxide, and hydrogen
production.