Isotropic plasma atomic layer etching of Al2O3
收藏4TU.ResearchData2020-10-21 更新2026-04-23 收录
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https://data.4tu.nl/articles/_/13011239/1
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资源简介：
Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.
提供机构：
Chittock, Nicholas
创建时间：
2020-10-21
