Isotropic plasma atomic layer etching of Al2O3

Data used to plot all of the figures in the letter titled "Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3)". Each figure has its own page, original origin files are available upon request.本数据集用于绘制题为《采用含氟等离子体与三甲基铝（Al(CH₃)₃）实现氧化铝（Al₂O₃）的各向同性等离子体原子层刻蚀》的研究快报中所有配图的数据。每张配图对应独立页面，原始Origin格式文件可按需获取。