Investigation the structure/properties relationship of novel grafted-to block copolymers for applications in nanolithography

The aim of the proposed experiment is to investigate the structure/properties relationship of novel grafted-to block copolymers of low molecular weight towards promising applications in nanolithography. The self-assembly of such grafted polymers has not been studied in detail. Especially, the capability of selective blocks to form rare morphologies that offers for these materials unique advantages for nanotechnology applications. Diblock copolymers with oligomeric side chains provide high controllability over their dimensions, enabling the creation of various architectures. The complex chemical architecture provides polymorphic behavior which can be addressed during in situ SAXS/WAXS experiments with multi-stage temperature program. The selective melting and crystallization processes of various blocs will be studied under different thermal conditions.