Synthesis Methodology of AlₓGa₁₋ₓAs Nanowires on mono-GaAs Surface: Electrochemical Deposition and Structural Characterization
收藏NIAID Data Ecosystem2026-05-02 收录
下载链接：
https://zenodo.org/record/14955295
下载链接
链接失效反馈官方服务：
资源简介：
This dataset contains the detailed methodology for synthesizing AlₓGa₁₋ₓAs nanowires on mono-GaAs substrates via electrochemical deposition. The document outlines preparation procedures for substrates, conditions for electrochemical etching, deposition processes, and subsequent structural characterization methods.
File 1 (Synthesis_AlGaAs.pdf): Describes step-by-step experimental protocols, including substrate preparation, electrolyte composition, deposition cycles, and analysis techniques such as SEM, EDX, and XRD.
The dataset serves as a reference for researchers aiming to replicate or adapt the synthesis methodology for semiconductor heterostructures.
Methodology:
Material: AlₓGa₁₋ₓAs nanowires on mono-GaAs substrates.
Substrate Preparation: Mono-GaAs wafers (n-type, Sb-doped, orientation (111)) etched in an HCl:H₂O (1:5) solution.
Electrochemical Etching: Performed in HCl:H₂O (1:4) under constant voltage (5V) for 7 minutes.
Electrolyte Composition: AlCl₃ solution (2:3 by mass, dissolved at 25°C and stirred for 10 minutes).
Electrochemical Deposition:
Three-electrode configuration (Pt as the counter electrode, Ag/AgCl as the reference electrode).
Cyclic deposition: 3 cycles with 2 minutes at 3V and 1 minute at 6V.
Final Treatment: Samples stabilized in the electrolyte without applied potential for 3 minutes and dried under a nitrogen stream.
Analysis Techniques: SEM (morphology analysis), EDX (elemental mapping and quantitative composition analysis), and XRD (crystallographic structure analysis).
File 1 (Synthesis_AlGaAs.pdf): Document detailing:
Substrate preparation and etching processes.
Electrolyte composition and preparation.
Electrochemical deposition protocols (parameters and cycles).
Characterization methodologies (SEM, EDX, XRD).
Software for Data Processing:
INCA Software (Oxford Instruments): EDX analysis
OriginLab: Data plotting and analysis
ImageJ: Image processing and analysis
创建时间：
2025-03-02
