XRD patterns of V2O5 thin film morphology dependent on substrate types
收藏Mendeley Data2024-01-31 更新2024-06-28 收录
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The DataSet contains the XRD patterns of the V2O5 thin film structure dependent on substrate types. The as-prepared thin films were deposited on alumina, zirconium, zirconium oxide and metallic vanadium substrate, then was annealing under an oxidizing atmosphere at 600C for 10h. X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees. The information about as-prepared thin film synthesis is described in the Journal of Nanomaterials.
创建时间:
2024-01-31



