Tribochemical Nanolithography: Selective Mechanochemical Removal of Photocleavable Nitrophenyl Protecting Groups with 23 nm Resolution at Speeds of up to 1 mm s¬–1
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https://figshare.shef.ac.uk/articles/dataset/Tribochemical_Nanolithography_Selective_Mechanochemical_Removal_of_Photocleavable_Nitrophenyl_Protecting_Groups_with_23_nm_Resolution_at_Speeds_of_up_to_1_mm_s_1/21842718/1
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资源简介：
Data for this paper, including AFM images and spreadsheets used to generate graphs and line sections in Figures 1-4, 6 and 7. Information on the calculations leading to Figure 5 in the paper is provided in the electronic Supplementary Information file available from the publisher's web site.
提供机构：
The University of Sheffield
创建时间：
2023-01-20
