X-Ray diffraction of the metallic nanostructures

Metallic nanostructures (gold and silver) were manufactured as a thermal annealing of gold or silver thin film. Gold films with thickness of 2.8 nm were deposited on a silicon substrates using a table-top dc magnetron sputtering coater (EM SCD 500, Leica), equipped with quartz microbalance for in-situ thickness measurements. Films were deposited from high purity (99.99%) gold or silver targets in pure Argon plasma. Thermal treatment of metallic thin film resulted in forming spherical isolated islands. XRD investigations (X'Pert diffractometer, using CuKα radiation in a range of 10°–70° of 2θ) showed an epitaxial growth of the structures. The crystallographic structure of metallic nanostructures repeat structure of silicon substrate.本数据集涉及的金、银金属纳米结构，通过对金或银薄膜实施热退火工艺制备而成。厚度为2.8 nm的金膜采用台式直流磁控溅射镀膜机（EM SCD 500，徕卡）沉积于硅衬底之上，该设备配备石英微天平以实现原位厚度监测。镀膜过程均采用纯度为99.99%的金或银靶材，在纯氩等离子体环境中完成。对金属薄膜的热退火处理可诱导形成球形孤立岛状结构。X射线衍射（X-ray Diffraction，XRD）测试采用X'Pert衍射仪，以CuKα辐射为光源，测试2θ扫描范围为10°~70°，结果表明该结构呈现外延生长特性。金属纳米结构的晶体结构与硅衬底的晶体结构保持一致。