Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma

Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO₂ with a SF₆/H₂ Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO₂ deposition on HfO₂, ZnO, Al₂O₃ and SiO₂; Reflection absorption infrared spectra on SiO₂ and Al₂O₃for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO₂ after plasma exposure. Further details can be found in README.txt and the manuscript.<br>

本数据集随一篇关于通过SF₆/H₂等离子体选择性钝化SiO₂实现区域选择性原子层沉积（Area-selective Atomic Layer Deposition）的研究手稿一同发布。数据集包含等离子体处理过程中各类基底的椭偏测量法（ellipsometry）数据，以及TiO₂在HfO₂、ZnO、Al₂O₃与SiO₂表面沉积的成核曲线；同时包含针对不同等离子体与反应物处理条件的SiO₂及Al₂O₃表面的反射吸收红外光谱，以及等离子体处理后SiO₂的X射线光电子能谱（X-ray photoelectron spectra）。更多详细信息可参阅README.txt文件及该研究手稿。