SEM inwestigation of the silver nanostructures
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Silver thin films with a thickness of 1nm, 3nm, 5nm, 7nm and 9nm were deposited by a table-top magnetron sputtering unit in a pure argon plasma from a high-purity silver target. Silicon wafers was used as a substrates. As-deposired films were annealed in Ar atmosphere at 550 Celsius degree for 15 minutes.As a result of annealing, Ag nanostructures formed on silicon. Morphology of obtained nanostructures was measured by SEM technique (FEI Quanta microscope).
提供机构：
Marcin Stanisław Łapiński
