Ultra-steep slope cryogenic FETs based on bilayer graphene
收藏NIAID Data Ecosystem2026-05-02 收录
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https://zenodo.org/record/10526846
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Dataset for the publication "Ultra-steep slope cryogenic FETs based on bilayer graphene".
Abstract:
"Cryogenic field-effect transistors (FETs) offer great potential for a wide range of applications, the most notable example being classical control electronics for quantum information processors.In the latter context, on-chip FETs with low power consumption are a crucial requirement. This, in turn, requires operating voltages in the millivolt range, which are only achievable in devices with ultra-steep subthreshold slopes. However, in conventional cryogenic MOSFETs based on bulk material, the experimentally achieved inverse subthreshold slopes saturate around a few mV/dec due to disorder and charged defects at the MOS interface.FETs based on two-dimensional materials offer a promising alternative.Here, we show that FETs based on Bernal stacked bilayer graphene encapsulated in hexagonal boron nitride and graphite gates exhibit inverse subthreshold slopes of down to 250 μV/dec at 0.1K, approaching the Boltzmann limit.This result indicates an effective suppression of band tailing in van-der-Waals heterostructures without bulk interfaces, leading to superior device performance at cryogenic temperature."
创建时间:
2024-08-16



