退火温度对氧化铬薄膜结构和高温摩擦学性能的影响

采用电弧离子镀技术在GH-4169高温合金基体上沉积氧化铬薄膜，并对薄膜进行了不同温度的退火处理，系统研究了不同退火温度(500、600、700和800 ℃)对薄膜形貌、薄膜结构、薄膜力学性能及薄膜摩擦学性能的影响. 结果表明：随退火温度升高，薄膜表面缺陷减少，氧化铬晶化趋于完善，薄膜硬度下降. 高温摩擦学性能方面薄膜经500和600 ℃退火后，在环境温度从室温到800 ℃宽温域范围内摩擦系数较退火前均有所增加；经800 ℃退火后的薄膜在环境温度为400~600 ℃时的摩擦系数均明显下降，但室温摩擦系数明显升高，宽温域内摩擦系数波动较大；700 ℃退火后薄膜宽温域内摩擦系数在0.21~0.33之间，波动较小.Chromium oxide thin films were deposited on GH-4169 superalloy substrates via cathodic arc ion plating technology, followed by annealing treatments at various temperatures. The effects of different annealing temperatures (500, 600, 700, and 800 ℃) on the morphology, crystal structure, mechanical properties, and tribological properties of the films were systematically investigated. The results show that as the annealing temperature increases, the surface defects of the films decrease, the crystallization of chromium oxide becomes more complete, and the hardness of the films decreases. In terms of high-temperature tribological properties, the friction coefficients of the films annealed at 500 and 600 ℃ increased within the wide temperature range from room temperature to 800 ℃ compared to the as-deposited films. For the films annealed at 800 ℃, the friction coefficients decreased significantly when the ambient temperature was in the range of 400–600 ℃, but the friction coefficient at room temperature increased notably, with large fluctuations across the entire wide temperature range. For the films annealed at 700 ℃, the friction coefficients within the wide temperature range ranged from 0.21 to 0.33, with relatively small fluctuations.

搜集汇总

背景与挑战

背景概述

该数据集研究了退火温度（500、600、700和800℃）对氧化铬薄膜结构和高温摩擦学性能的影响。结果表明，随退火温度升高，薄膜表面缺陷减少、晶化完善但硬度下降；在高温摩擦性能方面，不同退火温度导致摩擦系数在宽温域内呈现显著差异，其中700℃退火后摩擦系数波动较小。