The effect of the deposit temperature of ZnO doped with Ni by HFCVD

The raw (XRD) and data (PL) files required to reproduce the findings reported in "The effect of the deposit temperature of ZnO doped with Ni by HFCVD" . The effect of the deposit temperature of zinc oxide (ZnO) doped with nickel (Ni) by hot filament chemical vapor deposition (HFCVD) technique can be observed. All the samples were deposited for 1 min using a H2 flow of 50 sccm. The source-filament distance was 2 mm, constant in all the deposits. The variation of the filament-substrate distance produces a different substrate temperature (deposit temperature).