Supplemental Material
收藏DataCite Commons2024-11-14 更新2025-01-04 收录
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https://aip.figshare.com/articles/dataset/Supplemental_Material/27623565/1
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资源简介：
The Supplementary Material includes a detailed description of the fabrication process of the Cr patterned mask. We further present details on ToF - ERDA measurements and the MOKE system.
提供机构：
AIP Publishing
创建时间：
2024-11-14
