Data from: Polymer sequence alters sensitivity and resolution in chemically amplified polypeptoid photoresists

This dataset accompanies the article "Polymer sequence alters
sensitivity and resolution in chemically amplified polypeptoid
photoresists" by Cameron P. Adams, Carolyn Henein, Xiangxi Meng,
Javier Read de Alaniz, Christopher K. Ober, and Rachel A. Segalman. The
abstract for the full manuscript is: Continuous progress in semiconductor
technology relies on the ability to pattern transistors at sub-10 nm
dimensions, necessitating the development of high-resolution photoresists
for extreme ultraviolet (EUV) lithography. Chemically amplified resists,
traditionally composed of multicomponent polymer systems, face increasing
challenges at such patterning wavelengths due to nanoscale heterogeneity
and stochastic defects. To address these limitations, this study explores
polypeptoids—monodisperse, sequence-defined polymers—as a new class of
photoresists with precise molecular control. Systematic variation of
polypeptoid chain length reveals a critical threshold necessary for
successful pattern formation. Additionally, variations in monomer sequence
strongly impact both photoresist sensitivity and feature fidelity,
challenging conventional models that assume sequence effects should
average out across polymer chains. Finally, processing conditions such as
post-exposure bake temperature can be optimized to mitigate
sequence-dependent variability. These results highlight polymer sequence
as a powerful yet underexplored tool for tuning resist performance,
offering a promising pathway towards improved nanoscale lithography.