Modelling and simulation of OVD deposition process for optical fiber preform

This thesis presents a numerical investigation into the multiphase flow of SiCl4/O2/H2 during the OVD process. An innovative OVD process model has been successfully developed using the Eulerian-Eulerian approach. The model has been enhanced to incorporate the nucleation and growth of SiO2 particles. Various operating, geometric, and burner-related parameters have been examined. The findings demonstrate the existence of optimal conditions, such as the ideal raw gas flow rate, resulting in the highest deposition efficiency. Overall, numerical studies using our developed model provide a deeper understanding of the OVD system and valuable insights into the process optimization and quality control.