XRD analysis of the tellurium dioxide thin films
收藏Mendeley Data2024-01-31 更新2024-06-29 收录
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资源简介：
Tellurium dioxide thin films were deposited by magnetron sputtering method. The XRD analysis of the films annealed at 200, 500, 650 and 700 celsius degree showed appearing of crystalline phase in a higher temeratures.
创建时间：
2024-01-31
