Comparative Analysis of ALD/ALE-Deposited Films Across Varied Process Parameters and Material Properties

This analysis provides a systematic comparison of research findings on films deposited via Atomic Layer Deposition/Etching (ALD/ALE), utilizing a set framework based on twelve key properties, including material choice, precursors used, deposition temperatures, growth rates, and film characteristics such as thickness, density, refractive index, electrical and mechanical properties, chemical composition, surface roughness, and gas permeability. By aligning studies against these criteria, the comparison aims to elucidate the nuanced effects of different ALD/ALE parameters on film performance, offering insights into optimal process conditions and material selections for targeted applications. This comprehensive overview targets researchers seeking to enhance the efficiency and functionality of ALD/ALE-deposited films in various technological domains.