Dataset for Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

The dataset is a basis for a publication of Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS, intended to be of chapter 2 in the corresponding dissertation. In this dataset, the research objective "Exploring the use of atmospheric pressure atomic layer deposition (AP-ALD) in increasing the organic solvent resistance of polydimethylsiloxane flat substrates" was addressed. The data were collected using various characterization techniques (advanced microscopy, advanced spectroscopy, and newly developed barrier property testing). The presented data were in the form of images (jpg.), origin file containing the XPS and barrier property data (opju), table (xls) and graphs (spm).

本数据集为一篇关于采用常压原子层沉积（Atmospheric Pressure Atomic Layer Deposition, AP-ALD）技术提升聚二甲基硅氧烷（Polydimethylsiloxane, PDMS）有机溶剂抗性的学术研究提供支撑，同时将作为对应学位论文的第二章内容。本数据集围绕的研究目标为“探究常压原子层沉积（AP-ALD）技术在提升平面聚二甲基硅氧烷基底有机溶剂抗性中的应用”。本次研究通过多种表征技术（先进显微成像、先进光谱分析以及新开发的阻隔性能测试方法）采集相关数据。所提供的数据包含以下格式：图像文件（.jpg）、存储X射线光电子能谱（X-ray Photoelectron Spectroscopy, XPS）与阻隔性能数据的原始文件（.opju）、表格文件（.xls）以及绘图文件（.spm）。