Data for: Application of Hydrosilane-Free Atmospheric Pressure Chemical Vapor Deposition of SiOx Films in the Manufacture of Crystalline Silicon Solar Cells
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https://data.mendeley.com/datasets/v2wvd8nz8b
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资源简介：
Process sequences for the preparation of light-induced plated (LIP) silicon heterojunction (SHJ) solar cell front side metallization on transparent conducting oxide (TCO) by a) printing an Ag seed layer and by b) printing an organic local mask. Cu adherence to the TCO is promoted by LIP of less than1 µm thick Ni seed layer. Note that the existent rear side metallization and TCO layer are not shown.
提供机构：
Mendeley
创建时间：
2020-09-06
