XRD.zip
收藏DataCite Commons2023-06-13 更新2025-04-16 收录
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https://archive.data.jhu.edu/file.xhtml?persistentId=doi:10.7281/T1/XNZRR8/ZFQCY0
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资源简介：
Polymers were dissolved in appropriate solvents noted above and drop-cast on Si/SiO2 (300 nm of thermal oxide growth) substrate to form at least 100 nm of film thickness. The thin films were then collected and analyzed using a Bruker D8 Focus X-ray Diffractometer analyzer. Quantitative analysis was performed with a DIFFRACplus Software utilizing DIFFRACplus EVA and TOPAS programs. Measurements provided intensity distribution related to the angle 2θ. The instrument was calibrated with a NIST standard reference piece of polystyrene or Al2O3.
提供机构：
Johns Hopkins University Data Archive
创建时间：
2022-04-21
