Nitrogen ion implantation into HfMoNbTaTiWVZr high entropy metalic glass

This dataset contains results from a study on the effects of nitrogen ion implantation on the microstructure, mechanical properties, and tribological performance of an octonary high-entropy thin film metallic glass HfMoNbTaTiVWZr.

The dataset includes:

Microstructural and chemical analyses conducted using TEM, XRD, and EDS mapping, revealing the formation of binary nitrides, elemental redistribution, and surface modifications while maintaining a significant degree of amorphization.
Phase stability changes and preferential segregation of heavy elements, such as hafnium and tantalum, observed at high implantation doses.
Hardness measurements, showing an increase up to 20 GPa at an optimal implantation dose of 1×10¹⁷ ions/cm², attributed to solid solution strengthening, fine nitride formation, increased lattice distortion, residual stress, and densification.
Tribological performance data, demonstrating a reduced coefficient of friction and improved wear resistance after implantation.
Comparative hardness-depth profiles of ion-implanted films and magnetron-sputtered (HfMoNbTaTiVWZr)N thin films, confirming localized strengthening effects.

These data provide insights into nitrogen implantation as an effective surface engineering technique for enhancing material properties in extreme environments.