Assessing the quality of plasma etched InP laser facets - data

Broad area InP lasers were manufactured utilising both etched and cleaved facets with a variety of different cavity lengths. AFM topography data of eight sampled etched facets, four near the wafer centre and four near the wafer edge, have been provided for all five wafers in the form of .spm files. These files can be viewed with free and open access software e.g. Gwyddion. The “DeviceLookup.csv” file contains details on the p-contact dimensions, cavity lengths, the type of facets used by the device (EE for etched facets and CC for cleaved) along with the file name for the corresponding PIV data. The remaining .csv files contain the pulsed optical power versus current (PI) and current-voltage (IV) data measured using a calibrated integrating sphere at a controlled temperature of 21 degC. Current is measured in A, power in W and voltage in VResearch results based upon these data are published at http://doi.org/10.1109/LPT.2024.3397082