EPE contribution analysis data for multiple patterning lithography

The file full_ro_output_ADI_move2_clip.oas is the ADI layout. The file LE4 flow.pptx shows our model of LELELELE process. The inputs and outputs of the Monte Carlo test are stored in the *.mat files.The parameters Angle, Thin and Ratios represent the sidewall angle of etching process, the thickness and lateral ratio of the spacer deposition process. The Maskshift represents the random offsets in the x and y directions of each mask.The correspondence between CDs and spaces measured from the model and the layers marked with measurement positions in the layout is:CD1 corresponds to layer 1/1.CD2 corresponds to layer 1/2.CD3 corresponds to layer 1/8.CD4 corresponds to layer 1/9.CD5 corresponds to layer 1/10.CD6 corresponds to layer 1/11.Space1 corresponds to layer 1/3.Space2 corresponds to layer 1/4.Space3 corresponds to layer 1/5.Space4 corresponds to layer 1/6.Space5 corresponds to layer 1/7.<br><br>