Physical vapor deposition of thin gold film on crystalline silicon

This dataset contains supporting materials for the article entitled as "A novel method for realistically simulating the deposition of thin films from the gas phase and its application to study the growth of thin gold film on crystalline silicon" authored by S. Winczewski et al.
It contains animations presenting the MD+tfMC simulation of the physical vapor deposition of a 3 nm Au thin film on crystalline Si. The movies included in the dataset are animated versions of the visualizations shown in Figure 5 of this article, in its left (movie_1.mp4), middle (movie_2.mp4), and right (movie_3.mp4) columns. The representation of atoms is consistent with that used in Figure 5, except that in movie_3.mp4, the Au atoms classified as "other" are not displayed, for readability. Subsequent animation frames show the system state after successive tfMC runs. The counter at the top indicates the simulation progress by displaying the number of completed cycles.