Direct Surface Pattern of Organic Crystals Based on Photoinduced Molecular Decomposition

Lithography technology, as a key
process, has been widely
applied
in the patterning treatment of inorganic crystals, thus providing
important support for the manufacturing of electronic devices. However,
it has been a challenge to pattern organic single crystals, as they
are fragile and soluble in the solvents used in conventional methods.
Addressing these limitations, we develop a direct photolithography
strategy for patterning organic single crystals of 5-((9-ethyl-9H-carbazol-3-yl)methylene)-2,2-dimethyl-1,3-dioxane-4,6-dione
(5-CY MD), 2,2-dimethyl-5-(pyren-1-ylmethylene)-1,3-dioxane-4,6-dione
(5-PYMD), and (E)-2,2-dimethyl-5-(3-(10-phenylanthracen-9-yl)allylidene)-1,3-dioxane-4,6-dione
(5- PAYAD) without compromising structural integrity. Upon ultraviolet
exposure, these photosensitive crystals undergo spatially controlled
bond dissociation, thereby inducing localized molecular decomposition.
This selective photomodification generates multiscale patterns while
retaining crystallinity in unexposed regions. The novelty of this
strategy lies in its simplicity and cost-effectiveness, eliminating
the reliance on harsh solvents and laborious wet-processing steps.
This work not only achieves high-quality results but also paves the
way for systematic, controlled crystal patterning, advancing applications
in semiconductor technology and beyond.