Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α‑Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films
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https://figshare.com/articles/dataset/Volatile_and_Thermally_Stable_Mid_to_Late_Transition_Metal_Complexes_Containing_Imino_Alkoxide_Ligands_a_New_Strongly_Reducing_Coreagent_and_Thermal_Atomic_Layer_Deposition_of_Ni_Co_Fe_and_Cr_Metal_Films/2383060
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资源简介：
Treatment
of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with
2 equiv of α-imino alkoxide salts K(RR′COCNtBu) (R =
Me, tBu; R′ = iPr, tBu) afforded M(RR′COCNtBu)2 or [Mn(RR′COCNtBu)2]2 in 9–75%
yields. These complexes combine volatility and high thermal stability
and have useful atomic layer deposition (ALD) precursor properties.
Solution reactions between Ni, Co, and Mn complexes showed that BH3(NHMe2) can reduce all to metal powders. ALD growth
of Ni, Co, Fe, and Cr films is demonstrated. Mn film growth may be
possible, but the films oxidize completely upon exposure to air.
创建时间：
2016-02-18
