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Chemical investigations of the MoO3 doped by K films deposited FTO

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MoO3 thin films were synthesized via thermal annealing of thin, metallic Mo films deposited onto the FTO substrate using a magnetron sputtering system. The influence of photointercalation of alkali metal cation (K+) into the MoO3 structure on the photoelectrochemical properties of the molybdenum trioxide films was investigated. The chemical characterisation of materials was performed by XPS method. Especially Mo and K elemenets were studied on the basis of the high-resolution XPS spectra.

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