Recombination processes in intrinsic and p-doped low-threshold 1.3 µm InAs-based quantum dot lasers on silicon

Data for the paper with the following abstract.

On-chip lasers are a key component for the realization of silicon photonics. The performance of silicon-based quantum dot (QD) devices is approaching equivalent QDs on native substrates. To drive forward design optimization we investigated the temperature and pressure dependence of intrinsic and modulation p-doped 1.3 μm InAs dot-in-well (DWELL) laser diodes on on-axis silicon substrates for comparison with devices on GaAs substrates. The silicon-based devices demonstrated low room temperature (RT) threshold current densities (Jth) of 192 Acm-2 (538 Acm-2) intrinsic (p-doped). Intrinsic devices exhibited temperature stable operation from 170-200 K. Above this, Jth increased more rapidly due to increased non-radiative recombination. P-doping increased the temperature at which Jth(T) started to increase to 300 K with a temperature insensitive region close to RT, but with a higher Jth. A strong correlation was found between the temperature dependence of gain spectrum broadening and the radiative component of threshold Jrad(T). At low temperature this is consistent with strong inhomogeneous broadening of the carrier distribution, which is more pronounced in the p-doped devices. At higher temperatures Jth increases due to homogeneous thermal broadening coupled with non-radiative recombination. Hydrostatic pressure investigations indicate that while defect-related recombination dominates, radiative and Auger recombination also contribute to Jth.