Advances in Atomic Layer Deposition of Metal Sulfides: From a Precursors Perspective

Development at the nanoscale has established diverse
and complex
structures with the help of a growing selection of materials to choose
from. Among the major developments that has led to these creations
is the atomic layer deposition (ALD) technique that allows precise
linear stepwise synthesis of various nanomaterials, which is the defining
feature of ALD. Recent research activities have recorded an upsurge
in the synthesis and applications of metal sulfides created via this
technique. This rise in research on ALD of metal sulfides has established
varying methods to deposit each metal sulfide, which necessitates
a review that can analyze the major and minor advancements that have
been made in the field. Hence, this comprehensive review encompasses
the various ALD techniques with which metal sulfides have been synthesized,
followed by a thorough account of reported chemistry and parameters
by which various kinds of metal and sulfide precursors react, and
finally the existing, emerging, and potential applications that incorporate
metal sulfide ALD.