Phtometry measurements using spectroscopic ellipsometer of PAAO containing samples in air and water (AoI 45 deg., 60 deg., varying polarizer and analyser angles)

The file contains raw intensity data measured in reflection mode for various material combinations: porous anodized aluminium oxide (PAAO), gold nanoparticles (Au NPs), diamond-like carbon with silver nanoparticles composite (DLC:Ag), quartz, and silicon.

List of investigated samples:

Sample name
Sample description

AJ1
Aluminium substrate, ~241 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 16 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ2
Aluminium substrate, ~259 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 37 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ3
Aluminium substrate, ~293 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 8 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ4
Aluminium substrate, ~317 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 30 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ5
Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 57 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ6
Aluminium substrate, ~276 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 42 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

AJ7
Aluminium substrate, ~316 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 25 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

AJ8
Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 5 min 4 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

Q140
Quartz substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

Si140
Silicon substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

Ellipsometer: rotating compensator GES5-E (Semilab).

Light source: 75 W xenon short arc lamp with 185-2000 nm wavelength spectrum.

Detector: UV-Vis CCD with 0.8 nm resolution.

Spectral range: approximately 230-960 nm.

Mode: photometry.

Light incidence angles: 45°, 60°.

Polarizer angles: 0°, 90°.

Analyzer angles: 0°, 45°, 90°.

Light beam size: microspot (365 × 470 μm2 at 75° angle of incidence).

The reference was measured from aluminum mirror provided with the ellipsometer for each variation of measurement set-up.

Each sample was first measured in air and then after immersion in water. Focusing was performed before each measurement.

.smdx and .mup files are generated by the ellipsometer and can be opened using Semilab software. Their file names contain sample name, polarizer angle (Pol), analyzer angle (Ana), incidence angle (ang), and surrounding medium (air/water). .csv files are exported data related to each sample. .jpg files are for illustrative purposes to show the spectra. .rar file contains all the files in this upload.