Supporting data for "Wafer Scale High-κ Oxides Films Grown by Pulsed Laser Deposition"

We prepared wafer scale high dielectric constant oxides thin films using pulsed laser deposition method, and then apply it in 2D electronics. Here, we tested this (Ga, Cu) co doped ZnO thin films using different characterization methods and got information about this film. At the same time, we applied this high dielectric constant thin film in 2D electric device in order to get low leakage current and better electric performance. In future, we want to explore more kinds of high dielectric constant thin films and do more about its dielectric engineering.