Chemical etching of NiTi alloy: enhancing biocompatibility by surface nickel reduction

Raw data of results obtained during preparation of manuscript entitled: "Chemical etching of NiTi alloy: enhancing biocompatibility by surface nickel reduction".Database contains:.spm files that are accessible in Gwyddion app,.png files from SEM imaging,.txt files with deep profiling and spectra form ToF-SIMS,.opju file with combained XPS results,.xrdml files for XRD analysis, accesible in WinplotR app,.tif files from optical microscope,.xlsx files with contact angle measurements (also .ods copies of respective files).AFM measurements were conducted using Bruker Dimension ICON XR working in tapping mode with silicon tips on the silicon nitride lever with nominal radii of 8 nm.SEM measurements were performed using NOVA NANO SEM 200, while deep profile analysis was done by ThermoFisher Scientific Apreo 2 equipped with Time-of-Flight Secondary-ion mass spectrometry (ToF-SIMS).XPS analyses were carried out in a PHI VersaProbeII scanning XPS system (Al Kα 1486.6 eV).GIXRD was applied using an incident angle of 1° with Panalytical Empyrean x-ray diffractometer with a Co lamp (Kα = 1.7902). Samples were scanned with a 0.02° step in the range of 10° to 80° at room temperature.Contact angle and surface energy values were determined using Kruss DSA10Mk2, KRÜSS GmbH that worked in the sessile drop mode. Calculations of SFE by Owens-Wendt model.