Data underlying the publication: Role of the Coreactant on the Dual-Source Behavior of Lithium Hexamethyldisilazide for ALD Li-Containing Films

The publication is focused on unraveling the reaction mechanism of the lithium hexamethyldisilazide precursor for the growth of Si-free Li-containing thin films by atomic layer deposition (ALD). For this purpose the precursor was combined with various co-reactants and the ALD processes were investigated in situ by quadrupole mass spectrometry (QMS). The dataset contains the raw spectroscopic ellipsometry (SE), x-ray photoelectron spectroscopy (XPS) and QMS data, and the processed data.

本研究聚焦于解析利用原子层沉积（atomic layer deposition, ALD）制备无硅含锂薄膜所用的六甲基二硅氮锂前驱体的反应机理。为此，将该前驱体与多种共反应物复配，并通过四极杆质谱（quadrupole mass spectrometry, QMS）对ALD工艺开展原位表征研究。本数据集涵盖原始的光谱椭偏术（spectroscopic ellipsometry, SE）、X射线光电子能谱（x-ray photoelectron spectroscopy, XPS）以及QMS数据，同时包含经处理后的相关数据。