SEM micrographs of morphology evolution of V2O5 thin films on silicon substrate
收藏Mendeley Data2024-01-31 更新2024-06-28 收录
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The DataSet contains the scanning electron microscopy (SEM) micrographs of V2O5 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under an oxidizing atmosphere in the temperature range 250-600C. The results show that the morphology of the films dependent on the annealing temperature. The surface morphologies of the samples were studied by an FEI Company Quanta FEG 250 scanning electron microscope (SEM) (Waltham, MA, USA), mounting the analyzed sample on a carbon conductive tape. These results are part of a project defined in the Journal of Nanomaterials. In this paper, the information about samples and synthesis details are reported.
创建时间:
2024-01-31



