Dataset for "Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography"

This dataset contains the data used to create the figures within the article "Spatial periodicities inside the Talbot effect: understanding, control and applications for lithography" by Pierre Chausse and Philip Shields. The data comprises one-dimensional and two-dimensional data showing the spatial variation of the light intensity behind grating masks that are illuminated with collimated 375 nm optical radiation. The grating mask period has been varied from 600 nm to 1200 nm.本数据集包含用于生成皮埃尔·肖塞（Pierre Chausse）与菲利普·希尔兹（Philip Shields）所著论文《塔尔博特效应（Talbot effect）内的空间周期性：光刻的理解、控制与应用》中各类图表的原始数据。该数据集涵盖一维与二维数据，展示了经准直375 nm光学辐射照射的光栅掩模后方光强的空间分布变化。光栅掩模的周期已在600 nm至1200 nm范围内进行调整。