Amplitude ratio data of hexagonal structures prepared by Chemical Vapor Deposition on copper foil substrates

Ellipsometric parameters data use potential is assessment of graphene layer thickness on different surfaces. Data shows dependence of the amplitude ratio on the surface roughness of copper foil, gas concentrations and reaction zone conditions. Multiple amplitude ratio data files were collected from V-VASE Ellipsometer for various hexagonal structures on bare and treated copper foil substrates. Kaleidagraph 4.0 software was used to generate Fig. 1 a-d based on foil thickness and gas flow. Fig. 1 shows the amplitude ratio of materials within the graphite box (blue) and outside (green) on acetic-acid, treated copper foil thickness of (a) and (b) 25 µm, (c) and (d) 75 µm, and methane flow rate of (a), (c) 0.3 sccm and (b), (d) 0.2 sccm as well as control samples (yellow). Matched amplitude ratio was obtained only for 75 µm thick acetic acid treated copper foil at a low methane flow rate of 0.2 sccm. Moreover, Fig. 2 a,b show that the amplitude ratio of 75 µm bare copper foil and 75 µm electro-polished copper foil substrates at methane flow rates of 0.3 sccm were unmatched. This data is useful because it enables a non-destructive analysis of materials to probe materials class and uniformity.椭偏参数数据可用于评估不同基底表面的石墨烯层厚度。本数据集揭示了振幅比与铜箔表面粗糙度、气体浓度及反应区条件的依赖关系。本研究通过V-VASE椭偏仪（Ellipsometer）采集了多组振幅比数据文件，涵盖裸铜箔与经处理铜箔基底上的多种六边形结构。本研究使用Kaleidagraph 4.0软件，依据铜箔厚度与气体流速生成了图1a-d。图1展示了经乙酸处理的铜箔基底上，石墨盒内（蓝色）与盒外（绿色）材料的振幅比；其中(a)、(b)对应铜箔厚度为25 μm，(c)、(d)对应铜箔厚度为75 μm；(a)、(c)的甲烷流速为0.3 sccm，(b)、(d)的甲烷流速为0.2 sccm，同时包含黄色标记的对照组样品。仅当采用0.2 sccm的低甲烷流速处理75 μm厚的乙酸处理铜箔时，方可获得匹配的振幅比。此外，图2a、b显示，当甲烷流速为0.3 sccm时，75 μm厚裸铜箔与75 μm厚电抛光铜箔基底的振幅比并不匹配。该数据集具备重要应用价值，可实现材料的无损分析，用于探究材料类别与均匀性。