Data for the article entitled: "WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations"

Files include the data presented in the manuscript entitled: "WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations", by Mazur et al., https://doi.org/10.3390/ma16103831Fig. 1 presents X-ray diffraction patterns of WO3 thin films annealed at various temperatures.Fig. 3 presents results of transmission spectra of WO3 thin films annealed at various temperatures.Fig. 4 presents Tauc plots of WO3 thin films annealed at various temperatures with calculated optical energy band gaps.Fig. 5 presents comparison of average transmission in the visible wavelength range, fundamental absorption edge, and optical band gap energies of WO3 thin films annealed at various temperatures.Fig. 6 presents transmission spectra during colouring of WO3 thin films annealed at 473 K (Fig. 6a), 573 K (Fig. 6b) and 673 K (Fig. 6c) upon exposure to 200–1000 ppm H2.Fig. 7 presents variation in transmittance at 600 nm, 800 nm, and 900 nm during colouring/bleaching cycles of WO3 thin films annealed at 473 K (Fig. 7a), 573 K (Fig. 7b) and 673 K (Fig. 7c) upon exposure to 200–1000 ppm H2.Fig. 8 presents transmission spectra during colouring of WO3 thin film annealed at 673 K upon exposure to H2 concentrations of 25 ppm to 1000 ppm.Fig. 9 presents variation in transmittance at 600 nm, 800 nm, and 900 nm during colouring/bleaching cycles of WO3 thin film annealed at 673 K upon exposure to H2 concentrations of 25 to 1000 ppm.Fig. 10 presents Variation in extinction coefficient in time during colouring of WO3 thin film annealed at 673 K upon exposure to H2 concentration of: 25 ppm (Fig. 10a) and 1000 ppm (Fig. 10b).Fig. 11 presents Electron concentration in the function of time of the colouring cycle of WO3 thin film annealed at 673 K calculated based on the results of the extinction coefficient.本数据集包含Mazur等人发表于论文《基于气致变色效应（gasochromic effect）的低浓度氢气检测用三氧化钨（WO3）薄膜光学气体传感器》（原文标题：WO3 Thin-Film Optical Gas Sensors Based on Gasochromic Effect towards Low Hydrogen Concentrations，DOI: https://doi.org/10.3390/ma16103831）中的相关数据。 图1 展示了经不同温度退火的WO3薄膜的X射线衍射（X-ray diffraction）图谱。 图3 展示了经不同温度退火的WO3薄膜的透射光谱（transmission spectra）测试结果。 图4 展示了经不同温度退火的WO3薄膜的塔克图（Tauc plot），并给出了计算得到的光学能带隙（optical energy band gaps）数值。 图5 对比了经不同温度退火的WO3薄膜在可见光波长范围（visible wavelength range）内的平均透射率、基本吸收边（fundamental absorption edge）以及光学能带隙数值。 图6 展示了经473 K（图6a）、573 K（图6b）及673 K（图6c）退火的WO3薄膜在暴露于200–1000 ppm氢气（H2）时的着色过程透射光谱。 图7 展示了经473 K（图7a）、573 K（图7b）及673 K（图7c）退火的WO3薄膜在暴露于200–1000 ppm H2时，着色/褪色（bleaching）循环过程中600 nm、800 nm及900 nm波长处的透射率变化情况。 图8 展示了经673 K退火的WO3薄膜在暴露于25 ppm至1000 ppm H2的着色过程透射光谱。 图9 展示了经673 K退火的WO3薄膜在暴露于25 ppm至1000 ppm H2时，着色/褪色循环过程中600 nm、800 nm及900 nm波长处的透射率变化情况。 图10 展示了经673 K退火的WO3薄膜在暴露于25 ppm（图10a）及1000 ppm（图10b）H2时，着色过程中消光系数（extinction coefficient）随时间的变化情况。 图11 展示了基于消光系数计算结果得到的、经673 K退火的WO3薄膜着色循环过程中电子浓度（electron concentration）随时间的变化情况。