Tribochemical Nanolithography: Selective Mechanochemical Removal of Photocleavable Nitrophenyl Protecting Groups with 23 nm Resolution at Speeds of up to 1 mm s¬–1
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Data for this paper, including AFM images and spreadsheets used to generate graphs and line sections in Figures 1-4, 6 and 7. Information on the calculations leading to Figure 5 in the paper is provided in the electronic Supplementary Information file available from the publisher's web site.
创建时间：
2023-01-09
