Experimental Dataset for: Microwave plasma modelling for thick diamond deposition on III-nitrides

<b><i>***Please see readme and below for version changes. Current Version 2.0***</i></b>This dataset contains experimental measurements and growth data for samples produced in the above paper using the two sample holders in a microwave plasma chemical vapour deposition (MP-CVD) reactor. Within this dataset, the following information is provided:Raman spectroscopy spectra of flipped III-N on Si samples before and after diamond depositionMicroscope images of flipped III-N on Si samples before and after diamond depositionOptical emission spectra (OES) of microwave plasma using different holders and recipes with different microwave power density (MWPD).<br>- Low MWPD defined as below 3.5 kW 67 mbar<br>- Medium MWPD defined as 4 kW 93 mbar<br>-High MWPD defined as above 5 kW 147 mbarPhotos of samples during plasma operation from the top window of the MP-CVD reactor.For additional details not found here, please see the following paper:<br>https://doi.org/10.1016/j.carbon.2025.120349<br><b>Version Change History:</b><br><i>07/05/25 -&gt; Raman duplicate data amended, additional information provided on photo filenames</i>