SEM-EDS Microstructural Characterization of Open-Cell SnSb11Cu6 Alloy Material

Individual Image Descriptions: Image 1: Title: "BSE-SEM image of SnSb11Cu6 open-cell alloy (1000×)" Description: Backscattered electron SEM micrograph of open-cell SnSb11Cu6 alloy material. Acquisition parameters: 20 kV accelerating voltage, 1000× magnification, 6 mm working distance, high vacuum conditions. Scale bar: 50 μm. Sample ID: BS9. Date acquired: July 11, 2024, 10:55. Image 2: Title: "BSE-SEM image of SnSb11Cu6 open-cell alloy (1000×) - Region 2" Description: Backscattered electron SEM micrograph of SnSb11Cu6 alloy material showing alternative microstructural region. Acquisition parameters: 20 kV accelerating voltage, 1000× magnification, 6 mm working distance, high vacuum conditions. Scale bar: 50 μm. Sample ID: BS9. Date acquired: July 11, 2024, 11:10. Image 3: Title: "BSE-SEM image of SnSb11Cu6 open-cell alloy (500×) - Overview" EDS analysis: energy-dispersive X-ray spectroscopy for elemental composition and phase identification (data in Doc1.docx).单张图像描述： Image 1： 标题："SnSb11Cu6开孔合金的背散射电子扫描电镜（BSE-SEM）图像（1000×）" 描述：该图为SnSb11Cu6开孔合金材料的背散射电子扫描电镜显微照片。采集参数：加速电压20 kV，放大倍数1000×，工作距离6 mm，高真空环境。标尺：50 μm。样品编号：BS9。采集日期：2024年7月11日，10:55。 Image 2： 标题："SnSb11Cu6开孔合金的背散射电子扫描电镜（BSE-SEM）图像（1000×）——区域2" 描述：该图为SnSb11Cu6合金材料的背散射电子扫描电镜显微照片，展示了另一处微观结构区域。采集参数：加速电压20 kV，放大倍数1000×，工作距离6 mm，高真空环境。标尺：50 μm。样品编号：BS9。采集日期：2024年7月11日，11:10。 Image 3： 标题："SnSb11Cu6开孔合金的背散射电子扫描电镜（BSE-SEM）图像（500×）——全貌" 能谱分析（EDS，Energy-Dispersive X-ray Spectroscopy）：用于元素组成与物相鉴定的能量色散X射线光谱分析，相关数据详见Doc1.docx文档。