Analysis and Experimental Study of Impedance Matching Characteristic of RF Ion Source on Neutral Beam Injector

The impedance matching circuit is the important unit for the RF ion source, which is used to match the electric parameters of the RF generator and ion source antenna in order to transfer the RF power to the RF antenna of ion source and to get stable plasma. The plasma impedance will be changed during the plasma generation, since the impedance characteristic is not easy to be calculated and measured; it also necessary to do more experimental study. In this paper, the impedance matching unit was analyzed and designed according to the principle of RF ion source. The matching characteristic was studied during the experiment, and we achieved the best impedance matching characteristic. It also verified the good design of impedance matching unit. Based on the results of impedance matching studies, high-RF stable plasma discharge was achieved.射频（RF）阻抗匹配电路是射频离子源的关键组成单元，其功能为匹配射频发生器与离子源天线的电气参数，以将射频功率传输至离子源的射频天线，进而获得稳定的等离子体。在等离子体生成过程中，等离子体阻抗会发生动态变化，且其阻抗特性难以通过计算与测量获取，因此亟需开展更多实验研究。本文基于射频离子源的工作原理，对阻抗匹配单元进行了分析与设计；实验过程中对匹配特性展开了系统性研究，最终实现了最优的阻抗匹配效果，验证了该阻抗匹配单元设计的合理性。基于阻抗匹配的研究结果，本研究成功获得了高射频功率稳定等离子体放电。

搜集汇总

背景与挑战

背景概述

该数据集提供了中性束注入器中RF离子源阻抗匹配特性的分析与实验研究数据，包括基于RF离子源原理设计的阻抗匹配单元实验测试结果，旨在优化阻抗匹配以实现稳定等离子体放电。数据集由中国科学院合肥物质科学研究院的研究团队创建，涵盖物理学领域，包含9个文件（总计140.42 MB），并得到国家自然科学基金等项目资助。