Patterned_Surface_M+L
收藏DataCite Commons2024-06-14 更新2024-07-13 收录
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资源简介：
Description of sample:
• Patterned surface with superimposed sinusoids created using E-beam lithography technique.
• This digital surface twin contains pattern M + L
- Large wavelength (L with λ - 19.5 µm and amplitude - 10 nm)
- Medium wavelength (M with λ - 3.12 µm and amplitude - 4 nm)
Topography was measured using:
1. White Light Interferometer (Bruker Contour GT-I optical profilometer in phase shift interferometry mode)
2. Stylus profilometer (Alpha Step IQ KLA Tencor Stylus Profilometer with tip radius 5.9 µm)
3. Atomic Force Microscope (Bruker Dimension Icon VI with TapDLC 3000 tips of radius approximately 20 nm)
Data used in paper: https://doi.org/10.1021/acs.langmuir.4c00669
Tuning Surface Adhesion Using Grayscale Electron-beam Lithography
Authors:
• Arushi Pradhan. Affiliation 1. ORCID: 0000-0001-8169-7900
• Luke A. Thimons. Affiliation 1. ORCID: 0000-0003-4511-1807
• Nickolay Lavrik. Affiliation 2. ORCID: 0000-0002-9543-5634
• Ivan I. Kravchenko. Affiliation 2. ORCID: 0000-0003-4999-5822
• Tevis D.B. Jacobs. Affiliation 1. ORCID: 0000-0001-8576-914X
Affiliations:
1. Department of Mechanical Engineering and Materials Science, University of Pittsburgh, 3700 O’Hara St., Pittsburgh, PA 15208
2. Oak Ridge National Laboratory, Oak Ridge, TN 37830
Corresponding Author: Tevis Jacobs (tjacobs@pitt.edu)
提供机构：
contact.engineering
创建时间：
2024-06-14
