Atomic force microscope measurements of selected sub-pattern ridge-top surface roughness on patterned Ti and Si substrates, including average roughness (Ra), root mean square roughness (Rsq), and maximum roughness (Rmax).
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Data = mean ± standard deviation (n = 5).Atomic force microscope measurements of selected sub-pattern ridge-top surface roughness on patterned Ti and Si substrates, including average roughness (Ra), root mean square roughness (Rsq), and maximum roughness (Rmax).
创建时间：
2015-12-02
